Main Content

Epitaxy facilities

2 x 300mm Crius Cluster (Aixtron AG)

• MOVPE (metal organic vapour phase epitaxy) / CVD (chemical vapour deposition) cluster tool
• Wafer size: up to 12" (300 mm)
• CVD machine: Si/Ge/C-epitaxy
• MOVPE machine: III/V-epitaxy
• Brooks wafer handler for loading and transfer of substrates
• Epi Curve TT (LayTec)

2 x 2" III/V-MOVPE-systems (Aixtron AG)

• Two AIX 200 machines linked by Nitrogen filled glove-box
• Equipped with EpiRAS (Laytec)
• Equipped with mass spectrometer (Zeiss)

OXTRON

• Home-built (MOVPE/CVD) machine
• possibility for liquid injection